In this paper, we will study the reactivity along with substituent changes in the OH insertion reaction in copper carbenoids. To this end, we have used M06-2X functional with cc-pVDZ for light atoms and LanL2DZ for copper. We have studied the IRC insertion profiles and analysed reactivity indexes such as electrophilicity (ω) and pKa calculations. We have found that with R1 substitutions phenyl group, R2 substitutions amide group lower the reaction barrier considerably. Concerning the substrate reactions, the most favoured substituent is NO2 in para position.